Knowledge Hub
Your Gateway to Technical Knowledge Exchange for the Global Electronics Community
Explore our database of industry knowledge that fuels innovation, learning, and professional growth. Knowledge Hub is a collection of conference technical papers, webinars, presentations, on-demand video and more. You can search by author, title, keyword and type of content. You can also search for keywords and topics in the Tag field. Access to Knowledge Hub is reserved for members.
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An Alternative Solvent with Low Global Warming Potential
In the past 20 yrs the solvent industry has gone through a great deal of change. In the early 1990s,CFC-113 and 1,1,1-trichloroethane were the workhorses of the industry. The Montreal Protocol
.. read more
HCFC-225 Phaseout—What Now?
On January 1,2015,nine months from APEX 2014,the production and use restrictions on HCFC-225 will be in effect throughout the United States. This phase out is encompassing in scope. This phase
.. read more
New Cleaning Agent Designs for Removing No-Clean Lead-Free Flux Residues
The process cleaning rate theorem holds that the static rate (chemical forces) plus the dynamic cleaning rate (mechanical forces) equals the process cleaning rate. New lead-free flux residues r
.. read more
OA Flux Cleaning Studies on Highly Dense Advanced Packages Parameters
Cleaning flux residues post soldering has been a high reliability criterion practiced by assemblers of military,aerospace,automotive,medical devices and other value offerings. Highly dense adva
.. read more
Collaborative Cleaning Process Innovations from Managing Experience and Learning Curves
Moore’s Law infers that the number of transistors on a chip doubles approximately every two years. Consistent with Moore’s Law,high reliability electronic devices build faster processing speed
.. read more
An Alternative Solvent with Low Global Warming Potential
In the past 20 yrs the solvent industry has gone through a great deal of change. In the early 1990s,CFC-113 and 1,1,1-trichloroethane were the workhorses of the industry. The Montreal Protocol
.. read more
HCFC-225 Phaseout—What Now?
On January 1,2015,nine months from APEX 2014,the production and use restrictions on HCFC-225 will be in effect throughout the United States. This phase out is encompassing in scope. This phase
.. read more
New Cleaning Agent Designs for Removing No-Clean Lead-Free Flux Residues
The process cleaning rate theorem holds that the static rate (chemical forces) plus the dynamic cleaning rate (mechanical forces) equals the process cleaning rate. New lead-free flux residues r
.. read more
OA Flux Cleaning Studies on Highly Dense Advanced Packages Parameters
Cleaning flux residues post soldering has been a high reliability criterion practiced by assemblers of military,aerospace,automotive,medical devices and other value offerings. Highly dense adva
.. read more
Collaborative Cleaning Process Innovations from Managing Experience and Learning Curves
Moore’s Law infers that the number of transistors on a chip doubles approximately every two years. Consistent with Moore’s Law,high reliability electronic devices build faster processing speed
.. read more