New Solutions for Inclusion-free Copper Filling Of Through Vias for Latest Generation Substrate Designs
In advanced printed circuit board and IC substrate production, the metallization for blind vias and through vias (also called through holes – TH) is essential for the build-up of the PCB or IC Substrate. Filling of vias is important for planarity of the PCB as next mounted layers or components need to be placed with tight tolerance. It also helps to prevent moisture ingress, which can lead to corrosion and electrical issues over time. Filling of through vias with metallic copper by electrolytic plating provides various advantages compared to plugging paste, such as higher electrical and thermal conductivity as well as higher reliability, better mechanical stability, and reduced number of process steps. First through via filling process was described in 2005 [1], but also other emerging technologies, like the replacement of organic materials with glass for the core layer of IC Substrates, would benefit from advanced through via filling processes. Today, through via filling is primarily done in two different types of equipment, namely copper plater with horizontal transportation of the panel and vertical conveyorized plating (VCP) equipment.
Challenges that the industry is facing are driven by PCB and IC Substrate designs that require void-free filling of high aspect ratio [2] structures coupled with overall increasing number of through vias on a panel with areas of high hole density and areas with low hole density. In addition, based on circuitry density, pattern plating might be required.
In order to fulfill the demanding industry requirements, it is important to understand the interplay of chemical (electrolyte) and physical (equipment, process) parameters by identifying key factors influencing the mechanism of the through via filling process. In this paper we will review current state of the art of through via filling with electrolytic copper deposition from established horizontal plating systems [3] to newly developed pattern through via filling in VCP equipment with pulse plating. One example for a filled through via in pattern mode is shown in Figure 1.