The study of TCNCP solder joint quality with flip chip ETS
ETS (Embedded Trace Substrate) is one of advanced substrate design that enable to make fine width and space. The Cu trace open defect on ETS layer (L01) revealed by this OSP micro etching is non-detectable defect mode because OS test (Open-Short test) to detect this kind of defects is done before OSP process. The reason of OS test prior to OSP process is to prevent damage on Cu surface coated with OSP caused by OS test pin mark. OS test can be done after OSP process to detect this defect. But there was no specific study or approach regarding solder joint quality with OS test pin mark. TCNCP (Thermal Compression bonding with Non Conductive Paste) solder joint quality associated with OS test pin mark on ETS layer coated with OSP is investigated. This study demonstrates that Cu trace open on ETS layer generated by OSP micro etching can be detected by OS test prior to OSP process, and it is revealed that TCNCP solder joint quality can be worse due to increased NCP (Non Conductive Paste) entrapment as the number of OS test retrial times are increased.