The Complete Path to Least Resistance
The electroless copper deposit must form a metallurgical bond between the target pad and electrolytic copper deposit to survive reflow assembly. 4-wire resistance measurements conducted on PWBs and coupons during reflow assembly revealed that thermal excursions fractured microvias. Cross-section analysis subsequently located fractures at and in the vicinity of the electroless copper deposit. Fortunately, IPC test method 2.6.27 allows the industry to contain the problem while investigations proceed to identify the causes and solutions. Meanwhile the utility of stacked microvias and its deployment is tempered by the discovery of the weak interface and its susceptibility to fracture induced during reflow thermal excursions. The weak interface is a hidden reliability threat that is amplified by the proliferation of stacked microvia features acknowledged as too fragile for deployment in high hazard environments. This paper presents the results of an ongoing study that assesses the electroless copper deposit in microvias prior to electrolytic plating. Resistance measurements were completed on daisy-chained microvias fabricated using established production processes through electroless copper, skipping the electrolytic copper process. Measurements completed on the independent L1L2 and L3L4 microvia daisy-chains revealed variation in chain resistance attributed to the integrity of the electroless copper deposit in the microvia. Resistance measurement provided chain continuity assessment that is impossible by weight-gain and backlight evaluation. Published electroless copper deposit thickness ranges from 0.3 to 3.0 µm for immersion times of 4 to 30 minutes. Calculated resistance for 0.3 to 1.0 µm thickness ranges from 14.3 to 44.3 ohm for chains containing 1300 microvias of 75 or 127 µm diameters and 75 µm deep. Measured chain resistance ranged from 12.00 ohm to electrically open defined as 9.99 x 108 ohm, undetected by weight gain, backlight, and cross-section analysis. Variation in chain resistance implied deposit variation bringing the process into question because microvia fractures were associated with the electroless copper deposit. Deposit variation confounds metallurgical requirements. Sufficient for subsequent plating as noted in IPC-6012E 3.2.6.1 is vague and sets low expectations for deposit performance. No specification exists that covers the visual assessment of cross-sections adequately that predicts microvia reflow survivability. This is why the myriad efforts devoted to visual assessments fail to address the problem. No method focuses on the influence of the electroless copper deposit. The ultimate goal is to eliminate PWBs as the source of field-failures while the immediate task is to address the need for stacked microvias, therefore measured resistance is recommended to baseline electroless copper processes with respect to completing the path to least resistance necessary for subsequent plating.