Flux Activator Disappearance on Two Circuit Board Substrates
The kinetics of activator disappearance were investigated for a wave-soldering flux containing two activators,succinic and
glutaric acids. Three loadings of flux were applied to bare FR4 panels and copper-clad laminate coated with an organic
soldering protector (OSP),then baked at 110°C,95°C,80°C and 65°C for different times. The flux activator acids remaining
after baking were analyzed by ion chromatography. The experimental results were analyzed assuming 1st order kinetics of
acid disappearance and the Arrhenius equation. These results suggest:
• Glutaric acid disappears about 8 times faster than succinic acid on bare FR4 and about 2.5 times faster on OSP
panels.
• From the accelerated predictions,rates of glutaric and succinic acid disappearance on FR4 and OSP were
extrapolated for 40°C,and expected loss of these acids have been estimated as a function of time. While the glutaric
acid activator on both surfaces is 99% deactivated in 3 weeks at 40°C,the succinic acid requires 4.9 years for 99%
of the original amount to disappear at 40°C on bare FR4,but only 10 months at 40ºC on OSP.
• The measured actual rates of glutaric acid disappearance at 40ºC on bare FR4 and OSP were about ½ of the
predicted rates. The actual rate of disappearance of succinic acid at 40ºC on FR4 was about 6 times faster than the
extrapolated value. The 99% deactivation at 40°C for both acids on both surfaces have been calculated,and are 1.5
months for glutaric acid on both surfaces,one year for succinic acid on FR4 and 3.5 months for succinic acid on
OSP.