The Effect of Plating Cell Configuration on the Quality of Copper Deposit for Printed Circuit Boards
This paper addresses the effect of pulse plating of electronic interconnects for advanced electronic modules. This paper
builds on earlier work by correlating plating cell and tank design issues and tank characterization studies with standard
mechanical and reliability tests. The current work evaluates the resulting copper deposits in terms of throwing power,
mechanical and reliability tests and compares the results to a current state-of-the-art process. The present work relies on
electrical mediation for a highly controlled electrodeposition process that results in a very uniform and reproducible deposit;
selection of the electric mediation parameters is based on considerations of mass transfer as well as microprofiles and
macroprofiles related to current distribution. Data for plating industry test panels containing PTHs of approximately 5:1,
10:1,and 15:1 aspect ratios are presented. Using a pulse waveform sequence,throwing powers of approximately 90-100%
are observed at plating rates of approximately 20 ASF.