The Perfect Copper Surface
In order to provide the functionality in today’s electronics,printed circuit boards are approaching the complexity of semiconductors. For flexible circuits with 1 mil lines and spaces,this means no nodules,no pits,and excellent ductility with thinner deposits. One of the areas that has to change to get to this plateau of technology is acid copper plating. Acid copper systems have changed in minor increments since their introduction decades ago. However,the basic cell design using soluble anodes in slabs or baskets has for the most part remained the same. Soluble,phosphorized,copper anodes introduce particulate and limits the ability to control plating distribution.
The companies worked together to evaluate a new approach using insoluble anodes that are isolated from the main plating bath. Insoluble anodes are known to eliminate the particulate,provide consistent anode area and shape the anode to match the plated part. But isolating the insoluble anode dramatically reduces high consumption of organic additives typical with insoluble anodes. This new approach limits additive breakdown and & consumption normally seen at the soluble anode surface. The end result is a surface free of nodules,pits,and precise control of copper thickness distribution minimizing the impact of breakdown products.
This paper is to document the results from prototype testing through implementation into production. The system was first tested in pilot tanks at the companies to determine the impact on nodules and surface distribution. Data was generated looking at impact of anode design on plating distribution and surface for any defects. This data was utilized to design a full scale production line that is being used to quantify process improvement over existing production equipment. The goal for the work being done is a perfect copper surface.