New Circuit Formation Technology for High Density PWB
To meet future requirements for PWBs,various technologies of processes,materials and tools of PWBs have been discussed.
Especially important are technologies of circuit formation for high-end PWBs. Industrially the circuit formation method for
fine pattern has been changed,in these years,from the subtractive process to the Semi -Additive Process (SAP). SAP can
form finer circuits because it doesn’t cause side etching that is the problem of subtractive method. However the flash etching
process of SAP causes other problems such as short defects due to residual seed metal layer between circuits,circuit etching
and circuit delamination due to etching. Also,because of the roughness of the insulator surface that the circuits are formed
on,there are not only difficulties for fine circuits formation but loss of an electrical property.
In this paper,a new circuit formation method is discussed to overcome the problems that the flash etching process of SAP
causes. It does not need flash etching process therefore it can form finer patterns. The capability of this fine line circuit
formation depends upon the photo pattern resist resolution and was confirmed to perform well at L/S(Line/Space) = 10/10um
or less. Also the circuit pattern is buried in the insulator layer and is planer with the insulator surface,therefore the circuits
have high peel strength with insulator and there is less damage by manufacturing equipment or handling between processes.
This method is applicable to build up PCBs and FCPs as a circuit formation technology that meets future requirements.