Use of Ultrasonic Agitation for Copper Electroplating,Application to High Aspect Ratio Blind Via Interconnections
Using conventional PWB copper electroplating techniques (DC bath chemistry with air agitation),non-uniform deposition inside blind via features may arise when the vias have diameters less than 6 mils and aspect ratios greater than one. These observations result from two main causes: unfavorable solution hydrodynamics and the presence of air bubbles. Ultrasonic agitation (UA),well known for cleaning purposes,can provide a strong local agitation that "refreshes" the plating solution inside holes together with punching small trapped air bubbles. It has been demonstrated that UA greatly enhances the throwing power inside small blind via features. It must be pointed out that low UA power densities were used (2 to 8 W.gal-1). The frequency was 40 kHz and air was bubbled during plating. Using a conventional DC plating solution at 15 ASF,throwing power was improved on average by 35.9 %
for vias having a diameter of 6 mils and aspect ratio between 1.25 and 1.5. A more drastic 74.6 % throwing power improvement was noted for 4 mils blind vias having an aspect ratio of 1.9 and 2.4. Through ductility measurements,it has been also demonstrated that plated through hole reliability was improved using mild UA.