New Positive Working Dry Film Resist
We will present a new positive working dry film resist system that is suitable for high accuracy use. The new positive working dry film resist is composed of base polymers with active hydrogen functionality,and a
multifunctional vinyl ether compound plus a photo acid generator,and makes use of a chemical amplification method to allow imaging at low exposure levels of UV light. At the pre-bake stage,a ketal structure is formed by an additive reaction between the active hydrogen functional
groups and the vinyl ether. Consequently,the base resin is cross-linked and the resist becomes insoluble in an alkaline developer.
At the UV exposure stage,the photo acid generator forms a strong acid and the area of exposure becomes soluble in alkaline developer via an hydrolysis reaction. This new chemistry makes it possible to form a high reliability image with high contrast in comparison with conventional positive- and negative-acting systems. The new positive working dry film resist achieves on the order of 10?m Line/Space patterns plus the ability to tent 5mm diameter through holes with a resist as thin as 10?m.