Methodology for High Aspect Ratio Pulse Plating
Two years ago when IBM Endicott,now Endicott Interconnect (EI),was preparing to install a new Acid Copper
plating system,the Periodic Reverse Pulse (PRP) tanks installed at the end of the line were seen as a current density
capacity enhancement for "standard thickness" boards. At the time,there was limited demand for thicker,higher
aspect ratio boards which required plating in the pulse tanks. A lot has changed in the last two years!
In 2001,electroplated boards with a 15:1 aspect ratio were on EI’s strategic road map; now they are on the
manufacturing floor. The pulse tanks,empty two years ago,have evolved from merely being a productivity
enhancement to becoming technology enablers - plating EI’s highest aspect ratio boards.
This paper will discuss some of the methodologies of the plating system’s design,the strategy deployed in
evaluating and qualifying PRP and the migration to thicker boards. All of EI’s PRP work on the production line has
been done with Atotech's CUPRAPULSE S4 LEVELER system and PE PRP/DC rectifiers,capable of +1200A / -
3600A; but the methodology and results should be applicable for most plating systems. The impact of process
parameters and board features play a major role,but central to our findings is the need to migrate from a "one bath
for all applications" mentality,which compromises results and capability. One simply cannot get optimal results by
merely reducing the current density of their existing bath and just hoping for the best.