Enabling KCN-Free Stabilization for Mixed Reaction Gold Electrolytes
In the printed circuit board (PCB) industry, the surface finish acts as both protection layer and as active enabler for a broad variety of interconnecting techniques. The deposition of gold is one of the most common processes as it is applied in Ni/Au, Ni/Pd/Au, and Pd/Au finishes. Depending on the target thickness, different types of gold electrolytes are available on the market. They differ in the plating mechanism from fully immersion reaction type to mixed reaction type gold electrolytes. In mixed reaction type gold electrolytes, the plating mechanism is as a mixture of immersion reaction and autocatalytic reaction. The reducing agent defines the portion of the autocatalytic part in this mixed reaction. To control the autocatalytic reaction, stabilizers are used which typically contain free cyanide to support the gold complexation and prevent spontaneous decomposition and plate out.
In this paper, a new gold electrolyte is introduced which exhibits autocatalytic properties to deposit high layer thickness and defect-free electroless nickel immersion gold (ENIG) deposits where the stabilizer is nontoxic and does not contain free cyanide. By this it enables an easy, safe, and stable process handling up to bath lifetimes of more than 8 g/l gold with a gold concentration of 0.5 g/l. It was tested for Ni/Au, Ni/Pd/Au, and Pd/Au deposits; the performance results were compared to the process currently applied in the industry. The evaluation focuses on the solder joint reliability of the layers, the corrosive attack to the nickel layer, the thickness distribution, and the characterization of the gold deposit.