Novel Polyimide Build-up Material for Fine-line Fabrication
We have developed a new thermosetting polyimide build-up material for high performance build-up PWBs,which can mount
high speed CPUs with high I/O numbers. These PWBs meet the following requirements; good processability for the
fine-pitched circuits,the low dielectric characteristics,and the excellent mechanical properties.
Our proposed polyimide build-up material shows a dielectric constant (Dk) of 3.1 and a dielectric loss (Df) of 0.01 (at 1GHz).
Moreover the material shows following mechanical properties; a low coefficient of thermal expansion (CTE) of 45ppm and a
tensile strength of 100MPa. Even though the material has a low surface roughness Ra of less than 200n meters,we have
successfully deposited an electro-less plated copper layer with very high peel strength. This means that the material is
suitable for fabricating fine-pitched circuits,even when using a conventional semi-additive process. Actually,we could make
a fine-pitched circuit of less than 10micron L/S (Line and Space).