Stencil Design and Performance for Flip Chip/Wafer Bumping
There has been much recent interest in printing solder paste onto UBM pads of a wafer. Usually the wafer pad is overprinted
using a stencil aperture that is larger than the wafer pad. This permits optimum bump height after reflow. There is also
interest in printing solder paste onto flip chip pad sites on a substrate such as Fr4 or Ceramic.
This paper will examine stencil aperture designs for bumping applications. The test substrate contains 2 groups of pads;
Group 1 has 4 mil (100-micron) pads on 10 mil (250-micron pitch),Group 2 has 4 mil (100 micron) on 14 mil (350-micron
pitch). Group 1 is divided into 5 sectors of 400 sites per section. The stencil has 5 different aperture sizes for Group 1 ranging
from 5.5 mil (140 micron) to 7.5 mil (190 micron). Group 2 has aperture sizes ranging from 8 mil (200 micron) to 12 mil
(300 micron). AMTX Electroformed Stencils 1.5 mil (38 micron),2.0 mil (50 micron) and 2.5 mil (63 micron) thick are used
to print the Group 1 and Group 2 apertures. Bump height after reflow will be reported for each Group and compared to
theoretical Bump Height and Print Area Ratios.