Adhesiveless copper on polyimide substrates are used extensively for high density,flexible circuit applications. A
typical construction includes the polyimide substrate,a thin vacuum deposited metal tiecoat,a copper seedcoat,and
an electrodeposited copper layer. One or both sides of the polyimide may be metallized,and very thin copper can be
provided in order to facilitate formation of fine-line features. Since metal layers are direct deposited,not laminated,
the copper profile and bond treatment typically associated with copper foils are not present between metal and
dielectric. Adhesion between metallization and dielectric is achieved by performing plasma pretreatment prior to
metallization,and by the selection of a suitable tiecoat metal. Tiecoat metal is especially important to minimize
adhesion losses associated with circuit processing and subsequent environmental exposures. In this work,
characteristics of copper on polyimide substrates with nickel-chromium tiecoat are investigated. Adhesion,before
and after exposure to elevated temperature,pressure cooker conditions,and gold plating,is determined as a function
of tiecoat thickness. Additional characteristics,including etching performance and a practical example of using the
material to manufacture a high-density circuit,are discussed.
Author(s)
T. Bergstresser,R. Hilburn,H. Kaplan,R. Le