Acid Copper Plating Additive Improving Flexibility of Wiring Design for High Current Density
Chiplet technology is rapidly applied to the latest devices as high performance of semiconductor devices is required. As chiplet becomes vibrant, IC packaging substrates become bigger and more layered. High current density is required due to these changes of IC packaging substrates.
Wiring design also becomes complicated as the technology is matured. Especially IC packaging substrates have various wiring in a board such as L/S 8/8 μm below dense line pattern and 20 μm isolated line pattern.
Dense line pattern mentioned above is likely to have thinner plating deposition as electrical current flow is dispersed. On the other hand, isolated line pattern is likely to have thicker plating deposition as current flow is concentrated. Therefore, it leads to plating thickness unevenness.
Current density gap between isolated and dense fine line pattern is relieved by increasing electric charge of Nitrogen type organic compound (Leveler), and it leads to superior plating thickness uniformity.