Two challenges that advanced packaging suppliers are faced with during IC substrate fabrication are meeting the copper plating performance requirements and reducing manufacturing process costs. The copper plating must provide both high resolution and strict height uniformity within unit (WIU) and within a die/panel (WID). Plated features such as fine lines and pillars, whose top shape and coplanarity are critical to the product quality. A non-planar surface could result in signal transmission loss and introduce weak points in the connections. Therefore, copper plating solutions providing uniform, planar structures, that don’t require any special post treatment are highly desirable features for both redistribution layer (RDL) and pillar plating processes. The copper plating solution can also reduce cost by plating two or three types of features in a single step or from a single process bath. This flexibility allows fabricators to save on space and equipment.
In this paper, an electroplating (EPP) package, , is introduced to plate both RDL and pillars under different current densities in vertical continuous platers (VCP). The plating uniformity and coplanarity of both RDL fine lines and pillars was evaluated on a panel level.
The EPP package offered excellent coplanarity within a pattern unit for RDL plating. The variation in the plated height (or thickness) between fine lines and pads, of 5 and 50 μm widths respectively, was below 1.0 μm when using a current density of1.5 A/dm2 (ASD) for 66 minutes. For 10 μm wide lines, the plated copper thickness variation can be below 0.5 μm. The variation of plated thickness across 410 mm x 510 mm panels was below 1.0 μm, when the plated panel was measured at 3 points (top, middle, and bottom). The tops of the fine lines have defined, rectangular shapes. These types of profiles have excellent conductivity.
For pillar plating under higher current density, such as 5-10 ASD, the top of the pillars had slightly domed profiles. The pillars were very uniform within the die and within the panel.
Physical properties of the plated copper deposit are essential for the reliability of the finished product. A few key physical properties are tensile strength, elongation %, and internal stress. These properties show the tolerance of the deposit for thermal stress and warpage. The additives (wetter, leveler, and brightener) strongly influence the physical properties of the deposit. Copper deposited with the EPP package has tensile strength above 40,000 psi, elongation % above 18%, and internal stress below 1.0 Kg/mm2. The physical properties of the deposited copper did not change considerably during the bath aging, showing that the package has stable performance.
The reliability of both pillars and RDL features were evaluated via solder dip. The RDL features were dipped at 288°C, 6 times. The pillars were dipped at 288°C, 60 times. Neither feature showed any cracks or separation from the substrate.