Next Generation Pattern Electroplating Process for Microvia Filling and Through Hole Plating
The use of electrodeposited copper for filling blind microvias has grown rapidly to become an essential and widely adopted
process used by various Printed Circuit Board (PCB) and package substrate manufacturers. Driven by the need for increased
speed,portability and wiring density,the interconnect pitch on both semiconductor packages and High Density Interconnect
(HDI) substrates continue to shrink. As these designs evolve and dimensions shrink,the ability of copper filling process to
consistently produce void free copper filled microvias comes under increasing pressure.
This paper describes a new pattern-plate,Direct Current (DC) copper electroplating process designed for HDI and packaging
substrate applications. Process performance as a function of processing variables is discussed.