Imprinted Interconnects Technology (I2T),a Revolutionary Method for the Production of Very-High-Density Interconnects (VHDI)
Today’s HDI field of technology is coming under more and more pressure to increase wiring density and,even more
importantly,to decrease manufacturing costs. The current technological approach does not permit an adequate response to
this challenge and thus new,disruptive manufacturing technologies have to be developed.
Imprinting as a means of forming conductor patterns as well as via holes has been under discussion for several years now. A
more crucial issue,however,is to find a method for filling the recessed features reliably and inclusion-free with solid copper,
and consequently the overall build-up concept has to be adapted in order to utilize the full potential of this novel technique.
This paper describes a new manufacturing approach based on imprinting,a special copper plating process,followed by an
etch-back step. This method is capable of producing lines and spaces down to 10µm and thicknesses of up to 40µm.
Conductor and via pattern are produced simultaneously,thus making padless designs feasible.
The key elements of this radical new approach are the manufacture of the imprinting stamp,the imprinting itself and the
copper filling. Each necessary process step has been verified in a lab environment,and first functional samples have been
successfully produced. Continuing further development is underway to bring this technology from lab to fab within a
reasonable timeframe.