Deposition of Thin Copper in Pre-formed Vias on Thin Flexible Base Materials
This paper reports on further developments for an innovative copper deposition technology that was presented two years ago at this conference. At that time,the innovative technology was described as a way to replace conventional sputtering and vacuum deposition techniques while achieving greater feature diversity,lower cost,and higher performance. The advancements reported here include the extension of the technology to deposit thin (depths of 0.1 to 10.0 microns) copper with good adhesion on the interior of via walls that have been pre-formed in the base material. This process extension has been demonstrated on vias as small as 25 microns in diameter and on thin (7.5 to 12.5 micron) polyimide base materials.