Blind Micro Via and Through Hole Filling in Horizontal Conveyorised Production System
This paper presents a novel electrolytic copper panel plate system incorporating equipment and specially developed electrolyte which enables filling of blind micro vias with a minimum of surface plated copper.
The system utilises Uniplate plating equipment which may be combined into a wet to wet metallisation and copper plating line. The InPulse2 electrolytic copper plating module uses insoluble anodes for uniform plating conditions together with a special clamping system for electrical contact to the substrate which also enables production of material with thin copper foil down to 3 µm. Such material is becoming more common in HDI production but requires special techniques to ensure optimum surface distribution at high production current densities. The insoluble anodes are segmented and each anode segment has an individually controlled rectifier to ensure uniform blind micro via filling over the whole substrate.
Blind micro vias typically seen in hand held devices with 70 µm depth and 100 µm diameter can be easily filled with this system with only 15 µm copper deposited on the surface,this offers the possibility to meet the requirement for 2 MIL line and space with panel plating techniques. Also due to the low thickness of plated copper,savings in materials are very significant particularly in copper metal but also in solder mask and etching chemistry. This process has already reached a high acceptance in the mass production of HDI circuit boards particularly for hand held devices.
Development results showing the system capability also for through hole filling of substrates is shown together with discussion of possible application areas for this new technology.