The Effect of Copper Plating Processes and Chemistries on Copper Dissolution
Implementation of lead-free assembly processes results in higher copper dissolution rate than traditional SnPb alloys. The rate at which copper is dissolved could be dependent on many factors,such as solder alloy,contact time,solder temperature,flow rate,copper plating processes,copper grain structure,etc. The effect of assembly processes and process parameters on copper dissolution is well known and published. However,there is limited study on the influence of PCB (printed circuit board) fabrication processes and chemistries on copper dissolution.
This paper focuses on the effect of copper plating processes and chemistries on copper dissolution. Different Cu plating methods and chemistries were studied and compared. The paper will discuss the impact of Cu plating processes (direct current plating vs. pulse reverse plating),current density,plating chemistries and rectifiers on dissolution rate. The Cu microstructure from different plating methods is discussed.