Nano Technology Improve Critical Printing Process
The challenges of successful solder printing in the High Volume / Low Mix cell phone environment,which is linked with the continuing trend to miniaturize electronic assemblies,requires a new approach to improve the printing capabilities and process repeatability. Actual stencil technologies such as electroform or laser-cut limit the stencil opening due to aspect and area ratios at the smallest devices producing a very tight process window. It’s here that Nano Technology will assist in the printing process. Using Nano Coating over the stencil openings to smooth the surface and improving the paste release,helps reducing aperture openings,and creates a wider process window. Additionally,panel stretch and PCB fabrication tolerances produce a silent non constant variable that moves the process outside the quality printing window,without obvious signs of variation.
To obtain an advantage,and successfully implement this technology,the process requires new controls of chemical and parameter settings. We will discuss some aspects of process optimization and how this very tight process window is affected,by identifying the challenging process parameters,including circuit board fabrication,component pad design,and printing parameters (speed,separation,pressure,etc.). This printing study will consider the effects of print speed,print pressure,and separation speed,to optimize solder paste transfer efficiency (TE) to establish an statistical process control that gives real time warnings of an out of control printing process. We will discuss our data results which will include the advantage of using Nano stencil vs. E-Fab and Laser NiEX. TE improvement is 5% at the smallest stencil aperture across a panel of 4 images. The cleaning speed significantly reduces defects from 2% with a 50mm/sec,to zero defects using 20mm/sec. By improving the TE by 5% will increase the number of prints without a paste bridge on any board,even up to10 prints between cleaning.