Ultra-fine flexible circuitry has been more and more applied in electronic devices due to their fast innovation and the increasing demand on miniaturization,light weight and flexibility in some cases. These devices range from personal electronics to medical instruments,including smart phones,tablets,ultra-thin or/and convertible laptops,wear-able electronics,flexible connecting parts and antennas in all other types. In addition to their flexibility and light-weight advantages,flexible circuits need to incorporate ultra-fine features,maintain good signal integrity at high frequency transmission,and guarantee long-term use with good stability under heat-accumulated conditions. To meet such high requirements,polyimide (PI) has been the most widely used dielectric substrate material due to its very good electronic,physical and chemical properties. It has low Dk and Df to support high frequency signal transmission; low CT E,high Tg and Td to maintain good shape and size stability,thermal stability and processing ability; good chemical resistance,low moisture but good UV absorption. However,due to the superior properties above,it is generally difficult to obtain good PI-plating adhesion on the very smooth PI substrate,which is also required for good signal integrity in the ultra-fine circuitry. Even more challenging is to maintain the plating-PI adhesion at a certain high level after continuous exposure in a high temperature environment. To meet the demand,the company developed a semi-additive process (SAP-FLEX),which was tailored for different kinds of PI films widely used in the current market of the ultra-fine flexible circuitry. Using SAP-FLEX,the PI surface not only maintained a Ra lower than 27n m,but also consistently achieved a uniform initial peel strength from 715 to more than 2055 gf/cm on variant PI substrates. After a 7-day continuous baking test at 150oC,the peel strength can be maintained from 465 to more than 1287 gf/cm. This paper will discuss the SAP-FLEX process flow; its performance on different kinds of PI films; its processing window and the bath life of the adhesion promoter; and its process capability using Six-Sigma tools.
Author(s)
Fei Peng,Ernest Long,Jim Watkowski,William Bowerman