Effects of Tin Whisker Formation on Nanocrystalline Copper
Spontaneously forming tin whiskers,which emerge unpredictably from pure tin surfaces,have regained prevalence as a topic within the electronics research community. This has resulted from the ROHS-driven conversion to “lead-free” solderable finish processes. Intrinsic stresses (and/or gradients) in plated films are considered to be a primary driving force behind the growth of tin whiskers. This paper compares the formation of tin whiskers on nanocrystalline and conventional polycrystalline copper deposits. Nanocrystalline copper under-metal deposits were investigated,in terms of their ability to mitigate whisker formation,because of their fine grain size and reduced film stress. Pure tin films were deposited using matte and bright electroplating,electroless plating,and electron beam evaporation. The samples were then subjected to thermal cycling conditions in order to expedite whisker growth. The resultant surface morphologies and whisker formations were evaluated.