High Throw DC Acid Copper Formulation for Vertical Continuous Electroplating Process
Electronics industry has grown immensely over the last few decades owing to the rapid growth of consumer electronics in the modern world. New formulations are essential to fit the needs of manufacturing printed circuit boards and semiconductors. Copper electrolytes for high throwing power applications with high thermal reliability and high throughput are becoming extremely important for manufacturing high aspect ratio circuit boards. Here we discuss innovative DC copper metallization formulations for hoist lines and VCP (Vertical Continues Plating) applications with high thermal reliability and throughput for high aspect ratio PCB manufacturing. The formula has a wide range of operation for current density. Most importantly plating at high current density using this DC high throw acid copper process offers high throughput,excellent thermal reliability,and improved properties for present-day PCB manufacturing. The operating CD range is 10 –30 ASF where microdistribution of = 85 % for AR 8:1 is achievable. This formulation offers bright ductile deposits were plating parameters are optimized for improved micro-distribution and the properties of the plated Cu deposit such as tensile strength and elongation. The Thermal reliability and properties of the deposits were examined at different bath ages. Measured properties are Elongation = 18% and tensile strength = 40,000 psi. All the additives can be easily controlled by CVS (Cyclic Voltammetric Stripping).