The Total Environmental Solution For Any-Layer HDI Production
Copper Via-Fill application in acid copper plating of PWB is experiencing a significant growth due to the booming of smartphone and tablet PC. With this growth,the PC board demand of HDI complexity has also increased. The "any-layer" design is widely adopted in layer count reduction whereas the circuit density is increased due to more freedom in designing the circuitry. This kind of build-up process required 100% blind microvia fill up in every single layer and stack up for interconnect. The challenge of this design is the zero tolerance of dimple/void as well as minimal copper build up for ultra fineline circuit formation. The latest development of via-fill has set the new standard of zero dimple/void with copper build up less than 10 ?m. No copper reduction is required,even for the ultra fineline etching process in which the circuitry goes down from 20/20 ?m L/S to 15/15 ?m L/S. Another challenge of the process is prolonged plating cycle time. This paper will illustrate an advanced super-filling technology which was developed in the combination with green PTH alternative - conductive polymer direct metallization. The direct via-filling on conductive polymer becomes possible which could minimize the use of copper as well as shorten the total process cycle time by more than 50%. The extraordinary coverage of conductive polymer over glass and resin surpass the traditional electroless copper performance; thus enhance the current flow for via-filling. The mechanism of the specialized additive system over the conductive polymer was investigated. Today's equipment for copper via-fill in PWB industry is dominated by either vertical or horizontal conveyorized system. The hydrodynamic impact to super via-fill performance will also be discussed.